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Electronic transport and device prospects of monolayer molybdenum disulphide grown by chemical vapour deposition

机译:单层钼的电子输运和装置前景   通过化学气相沉积生长的二硫化物

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摘要

Layered transition metal dichalcogenides display a wide range of attractivephysical and chemical properties and are potentially important for variousdevice applications. Here we report the electronic transport and deviceproperties of monolayer molybdenum disulphide (MoS2) grown by chemical vapourdeposition (CVD). We show that these devices have the potential to suppressshort channel effects and have high critical breakdown electric field. However,our study reveals that the electronic properties of these devices are atpresent, severely limited by the presence of a significant amount of band tailtrapping states. Through capacitance and ac conductance measurements, wesystematically quantify the density-of-states and response time of thesestates. Due to the large amount of trapped charges, the measured effectivemobility also leads to a large underestimation of the true band mobility andthe potential of the material. Continual engineering efforts on improving thesample quality are needed for its potential applications.
机译:层状过渡金属二卤化物显示出广泛的吸引人的物理和化学性质,对于各种设备应用可能具有重要意义。在这里,我们报告通过化学气相沉积(CVD)生长的单层二硫化钼(MoS2)的电子传输和器件性能。我们表明,这些器件具有抑制短沟道效应的潜力,并具有很高的临界击穿电场。但是,我们的研究表明,目前存在这些设备的电子特性,但由于存在大量的带尾陷态,因此电子设备的性能受到严重限制。通过电容和交流电导率测量,我们系统地量化了状态密度和这些状态的响应时间。由于大量捕获的电荷,所测得的有效迁移率也会导致对真实带迁移率和材料潜力的极大低估。潜在的应用需要持续的工程工作来提高样品质量。

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